The invention discloses a forming method for metal silicide, which comprises the following steps of: providing a substrate with the surface having silicon material;
本发明公开了一种金属硅化物的形成方法，包括步骤：提供一表面含硅 材料的衬底；
The invention discloses a forming method for metal silicide, which comprises the following steps of: providing a substrate with the surface having silicon material;
本发明公开了一种金属硅化物的形成方法，包括步骤：提供一表面含硅 材料的衬底；
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