The principle and control algorithm of temperature compensation for Sub Micron projection lithography objectives are introduced.
主要介绍一种光刻机投影物镜温度补偿控制的原理及控制算法。
The large field projection lithography lens is a special optical lenses form, which put an high demands on the design and processing both for mechanical and optical.
大视场投影光刻物镜是光学系统中的一种特殊的形式，其设计加工要求高。
The calculative method of the large field projection lithography lens is presented, and on the distortion measuring setup which is accomplished, distortion measurement of 8 inch wafer is completed.
提出了针对大视场投影光刻物镜畸变的计算方法，并在完成的畸变特性测量装置上进行了8英寸的硅片测量。
Mostly introduction the of detection and the of prealignment technology of the Wafer Loader system in the Projection-Lithography equipment.
介绍投影光刻机设备的晶片传输系统中切边探测和晶片预对准技术。
Mask fabrication is a key technique of scattering with angular limitation projection electron-beam lithography (SCALPEL).
掩模制作是电子束散射角限制投影光刻(SCALPEL)的关键技术。
In high numerical aperture and low technic factor lithography process, degradation of the image quality because of the coma aberration in the projection lens has become a serious problem.
在高数值孔径、低工艺因子的光刻技术中，投影物镜彗差对光刻质量的影响变得越来越突出，因而需要一种快速、高精度的彗差原位测量技术。
The projection electron beam lithography with angular limitation(PEBL)is potentially one of the most attractive techniques for nano lithography in the21st Century.
具有角度限制的电子束投影曝光技术有可能成为21世纪最有潜力的纳米光刻技术之一。
Two main installation methods of lithography projection lens were studied in this paper, and their characteristics were discussed.
对两种主要的光刻投影物镜安装方式进行了研究，并对各自特点进行了讨论。
An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed.
本发明公开一种设备和方法，用于在更换平板印刷机(10)中工件(208)期间，将浸没流体(212)保持在邻接投射透镜(16)的间隙中。
An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed.
本发明公开一种设备和方法，用于在更换平板印刷机(10)中工件(208)期间，将浸没流体(212)保持在邻接投射透镜(16)的间隙中。
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