With the excellent performance sub-atmospheric pressure boron phosphorus silicon glass (SABPSG) has been widely applied in the DRAM semiconductor manufacturing of 0.
次大气压硼磷硅玻璃（简称SABPSG）开始凭借其优良的性能被广泛应用于0。
Sub-atmospheric pressure chemical vapor deposition is described with a directed reactant flow and a substrate that moves relative to the flow.
本发明描述使用定向反应物气流和相对于所述气流移动的基板的次大气压化学气相沉积。
Sub-atmospheric pressure chemical vapor deposition is described with a directed reactant flow and a substrate that moves relative to the flow.
本发明描述使用定向反应物气流和相对于所述气流移动的基板的次大气压化学气相沉积。
应用推荐