• A new large area microwave plasma source has been developed.

    研制了一种新的大面积微波等离子体源。

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  • In this paper, a glow discharge plasma source ion implantation technique is described.

    本文叙述了辉光放电等离子体源的等离子体源离子注入。

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  • The design method for space plasma source and measurement system is introduced in this paper.

    文章介绍了空间等离子体源与测试系统的设计方法。

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  • A low power inductively-coupled microwave plasma source based on planar spiral microstrip at 2.

    本文提出一种基于平面螺旋微带的2。

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  • This method would be very helpful to the design of practical plasma source ion implantation processes.

    这一分析方法对实际等离子体源离子注入应用具有重要的指导作用。

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  • Optical thin film properties deposited using the adapted high ion current plasma source are likewise described.

    最后描述了利用高离子电流密度等离子体镀膜的光学薄膜。

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  • Diamond films had been deposited on quartz tube with the gas mixture of ethanol steam and hydrogen by the plasma source.

    使用该等离子体源以乙醇蒸汽和氢气为气源在石英玻璃管外表面沉积金刚石膜。

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  • The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.

    利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。

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  • Plasma source ion implantation is a new non-line of sight ion implantation technique for surface modification of materials.

    等离子体源离子注入技术是一种新型的非视线的离子注入材料表面改性技术。

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  • The ultrashort pulse laser plasma source works in ultrashort time, with high energy density and is able to be tuned, controlled easily.

    超短脉冲激光等离子体源作用时间超短,能量密度高,可调谐,易于控制。

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  • A microwave three probe system has been used to study the changes of annular waveguide plasma source impedance with operational parameters.

    采用微波三探针研究了环形波导等离子体源阻抗特性随运行参数的变化。

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  • The invention relates to an ion implanter (imp) comprising a pulsed plasma source (SPL), a substrate support plate (PPS) and a power supply (ALT) for said plate.

    本发明涉及离子注入机imp,包括脉冲等离子体源spl、衬底支承台PPS和所述台的电源alt。

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  • Mssbauer measurements have been carried out for pure iron powder samples, the whose surface was implanted with nitrogen ions by plasma source ion implantation techniques.

    采用等离子体源离子注入方法,将氮离子注入纯铁粉中,对样品进行穆斯堡尔谱研究。

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  • Owing to the enlarging of scale, components of plasma source no longer match with each other, resulting in performance descending, high energy cost and more frequent maintenance.

    由于尺度放大,氧等离子体源各组件间会出现失配现象,直接导致系统性能差、能耗高、维护任务重。

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  • This plasma source has been used for modifying the surface of soybean fiber. Experimental results indicate that the performances of the treated fiber have obviously been improved.

    从扫描电镜等测试结果显示,改性后大豆纤维的表面性能有明显改善。

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  • A compact ECR plasma source, the strengths of which are its ultra low electron temperature, its low pressure and its ultra low density, was developed and built for such a simulator.

    本文就是为空间电离层环境模拟器研制的扩散型极低气压、低电子温度和极低密度的紧凑型电子回旋共振等离子体源的研制。

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  • The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.

    等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。

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  • It comprises transport of activated gas from a remote plasma source to an area in the chamber in a uniform way through at least two injection points on equivalent paths for the reactive species.

    所述方法包括通过至少两个注射点且在用于反应性物质的等同路径上以均匀的方式将被活化的气体从远程等离子体源输送至所述室中的区域。

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  • In years past, spicules had been judged too cool to be a source of the high temperature plasma that, among other things, generates the sun's ultraviolet light.

    过去,人们认为针状体的温度太低,除了产生太阳的紫外线,并不足以作为高温等离子体的发射源。

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  • A method detecting and measuring the intensity of spectrum from laser plasma soft X-ray source is presented.

    提出了一种新的探测和测量激光等离子体软X射线源光谱强度的方法。

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  • Thick diamond films were deposited by DC plasma jet using methane as carbon source.

    以甲烷为碳源气体,用直流等离子射流法制备了金刚石膜。

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  • The plasma microwave radiation, as a novel high power microwave(HPM) source, has gotten more attention in recent years for its merits of broadband, coherent emission and tunable frequency.

    近年来,等离子体微波辐射作为新兴高功率微波源,因其具有频带宽、相干和可调谐等优点,因而受到国际上的广泛关注。

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  • Using high - power pulsed laser - produced plasma as soft X - ray source for approach lithography is described in this paper.

    描述了用高功率脉冲激光打靶产生的等离子体作为软x射线源而进行的接近式软x射线光刻研究。

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  • The source has been used to study the effect of pressure on argon plasma parameters and microwave power for plasma ignition and extinction.

    环形波导内侧开有多个狭缝用来激励产生等离子体。 利用该源研究了气压对等离子体参数、击穿功率和熄灭功率的影响。

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  • Plasma that is collected solely for further manufacturing is called Source Plasma.

    收集到被单一地用作进一步加工的血浆成为源血浆。

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  • Laser plasma soft X_ray source is a kind of pulsed light source. There are several diagnostic methods for this kind of light source.

    激光等离子体软X射线光源是脉冲式光源,对这类光源的光谱诊断有几种方法。

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  • Underwater plasma sound source, namely underwater sparker, is a significant application of pulsed discharge in water, which has been employed for underwater acoustics and sea oil prospecting.

    水下等离子体声源是水中脉冲放电技术在水下声学和地震勘探技术方面的一个重要应用,又称为电火花震源。

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  • Underwater plasma sound source, namely underwater sparker, is a significant application of pulsed discharge in water, which has been employed for underwater acoustics and sea oil prospecting.

    水下等离子体声源是水中脉冲放电技术在水下声学和地震勘探技术方面的一个重要应用,又称为电火花震源。

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