According to the analysis of the photoresist process that got organic initiator conditions, nanometer of physical map was obtained.
根据对有机引发剂条件下的光刻胶过程的分析得出了纳米级实体图。
The process of SU-8 photoresist lithography is researched, and the influence of steps like coating and soft-bake on the lithography is studied.
初步研究了SU-8胶的光刻工艺流程，讨论了涂胶、前烘等各个步骤对光刻结果的影响。
We developed a non silicon surface micro machining process with two or three mask electroplating layers and using polyimide or photoresist as sacrificial layers.
我们研制的非硅表面微机械工艺采用两次或三次掩模电镀层，聚酰亚胺和光刻胶分别作为底层和第二、第三层的牺牲层。
Process parameters of SU-8 photoresist based UV-LIGA technique were optimized. The influences of expose time and the wavelength of expose source (on the resist formation) were investigated.
对基于SU - 8胶的UV -LIGA技术进行了工艺优化，研究了光源波长和曝光时间对SU - 8胶成型的影响。
Its optical density, with help from a metallic layer, has been achieved at 5.5. Since this organic material is a negative photoresist, the fabrication process is rather simple.
借助金属层，其光学密度已达到5.5。由于这种有机材料是负性光敏抗蚀剂，所以加工过程相当简单。
The process was controllable and could be applied to strip the photoresist residual of diffractive optical element fabricated on the thick substrate.
该工艺具有良好的可控性，解决了在厚基片上制作大口径衍射光学元件时残余光刻胶的去除问题。
That so-called "cold welding" process did make use of a temporary adhesive, a substance known as a photoresist.
这种名叫“冷焊”的工艺使用的是临时粘合剂，一种叫做光刻胶的物质。
RELACS process could be used to manufacture T-gate with various type photoresist.
RELACS技术可以应用于不同光刻胶类型的“T”，型栅制作中。
Recording the interference fringe produced from two coherent light beams by use of photoresist is a key process in manufacturing a holographic grating.
由光致刻蚀剂记录两束相干光干涉条纹是制作全息光栅的关键步骤。
Recording the interference fringe produced from two coherent light beams by use of photoresist is a key process in manufacturing a holographic grating.
由光致刻蚀剂记录两束相干光干涉条纹是制作全息光栅的关键步骤。
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