Useful information has been resulted for the practical fabrication of the phase mask.
这些都为相位掩模的实际制作提供了有意义的结果。
In this article the influence of phase mask characteristic on OFG performance is introduced.
介绍了相位掩膜特性对光纤光栅(OFG)性能的影响。
The original expression for phase mask plate can be extended according to the design principle of traditional phase mask plate.
根据传统相位掩膜板的设计原理，从两个方面对原有的相位掩膜板表达式进行扩展。
The diffraction characteristics of the phase mask for UV-written fiber grating is investigated using rigorous coupled-wave theory.
本文利用严格耦合波理论对用于光纤光栅制作的相位掩模的衍射特性进行了深入的研究。
Fabrication of the Bragg grating in a highly nonlinear photonic crystal fiber was investigated experimentally by phase mask method.
采用相位掩模版法实验研究了高非线性掺锗光子晶体光纤中布拉格光栅的制作。
It is noteworthy that the wavelength of the fiber Bragg grating would be tuned via only a phase mask in a phase mask interferometer.
值得注意的是在相位干涉法中，只用一块相位模板，就可以调整写入光纤布拉格光栅的波长。
Fiber Bragg gratings (FBG) prepared in terms of a phase mask technique and the FBG temperature sensor with plating gold were introduced.
介绍了用相位掩膜方法制作光纤布拉格光栅(FBG)以及镀金的FBG温度传感器。
The fabrication of FBG in four different type photosensitive fiber through phase mask is finished successfully and the photosensitivity of the four-type fiber is studied.
采用相位掩模法在四种不同的光敏光纤中成功写入布拉格光纤光栅，并对四种光纤的光敏性进行了研究；
By means of phase mask technology, 1 FBGs with reflectivity of 20% and 99% were written into standard communication fibers and special germanium doped fibers, respectively.
利用相位掩膜技术：1在一般标准通信光纤和锗掺杂特种光纤上分别写入反射率分别为20%和99%的FBG。
Using only one optic element, the phase mask provides a robust and inherently stable method for reproducing fiber Bragg gratings, and reduces the complexity of the fiber grating fabrication system.
由于相位模板法仅使用一个光学器件，因而减少了光纤光栅制造系统的复杂性，是光纤布拉格光栅写入法中最有前途、使用最广泛并且具有本征稳定性的一种方法。
Fiber grating is manufactured by application of phase mask means, which is of low requirement of time coherence and monochromaticity for light-source, simple craft and high rate of finished products.
运用相位掩模法刻蚀光纤光栅，该方法对光源的时间相干性和单色性要求较低，工艺简单，成品率高。
The principle, making method, technology and procedure for the rim phase shifting mask are described. Some experimental results are given.
论述了边缘相移掩模的原理、制作方法和工艺步骤，并给出了一些实验结果。
It utilizes optical phase shifting mask to improve resolution limit for an existing wafer stepper.
它应用了光学相移掩模方法，大大提高了现有光学光刻设备的分辨率水平。
Therefore, a new approximation model for alternating phase shift mask considering shadowing effects was proposed in this paper, and shadowing ratio was redefined.
因此本文针对交替式相移掩模，提出了一种考虑阴影效应的近似模型。
Measure each phase conductor to metal mask and to metal sleeve insulation resistance.
测量每相导体与金属屏蔽、金属套间的绝缘电阻。
Measure each phase metal mask, metal sleeve to ground insulation resistance.
测量每相金属屏蔽、金属套与大地之间的绝缘电阻。
With that mask, an improved procedure on fabrication of phase type CGH is also presented.
利用掩模板，本文同时展示了一种加工位相型CGH的新工艺流程。
The second is a coded mask photographic interferometer using white light. It can be used for measuring strongly varied phase obj...
第二种是用白光的(编码板)照相干涉法。它们能用于强变化位相体的测量。
The second is a coded mask photographic interferometer using white light. It can be used for measuring strongly varied phase obj...
第二种是用白光的(编码板)照相干涉法。它们能用于强变化位相体的测量。
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