Two new methods of fabricating micromegas are introduced, one is a quasi LIGA process using SU8 as the insulation layer, and the other is a process using a dry film as a patternable insulation layer.
本文介绍了利用两种方法制作微网气体探测器微结构的工艺，一种是利用准LIGA工艺，以SU8胶为绝缘层；另一种是利用干膜做绝缘层来制作微网气体探测器。
Two new methods of fabricating micromegas are introduced, one is a quasi LIGA process using SU8 as the insulation layer, and the other is a process using a dry film as a patternable insulation layer.
本文介绍了利用两种方法制作微网气体探测器微结构的工艺，一种是利用准LIGA工艺，以SU8胶为绝缘层；另一种是利用干膜做绝缘层来制作微网气体探测器。
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