The effect factors such as the buried channel junction depth and substrate doping concentration on the CCD's optimum operating point and maximum charge capacity are analysed.
分析计算了埋沟结深、衬底掺杂等对CCD最佳工作点及最大电荷处理量的影响。
The effect factors such as the buried channel junction depth and substrate doping concentration on the CCD's optimum operating point and maximum charge capacity are analysed.
分析计算了埋沟结深、衬底掺杂等对CCD最佳工作点及最大电荷处理量的影响。
应用推荐