Optical thin film properties deposited using the adapted high ion current plasma source are likewise described.

最后描述了利用高离子电流密度等离子体镀膜的光学薄膜。

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Optical thin film properties deposited using the adapted high ion current plasma source are likewise described.

最后描述了利用高离子电流密度等离子体镀膜的光学薄膜。

youdao