Raman spectrometer and atom force microscope were employed to study and determine the structure and characteristics of the films prepared by the method of magnetron sputtering with graphite target.
用激光拉曼谱和原子力显微镜等现代分析手段研究了磁控溅射石墨靶制备的薄膜的结构和特性。
Raman spectrometer and atom force microscope were employed to study and determine the structure and characteristics of the films prepared by the method of magnetron sputtering with graphite target.
用激光拉曼谱和原子力显微镜等现代分析手段研究了磁控溅射石墨靶制备的薄膜的结构和特性。
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