A method of photo-mask lithography for fabrication of micro Fresnel lenses Arraywas presented in this paper.
本文介绍用制版的方法制作的微菲涅耳透镜列阵及其成像实验。
This article mainly explains the process of LIGA technology, which includes X-ray mask lithography, Micro-electroforming and Micro-copy.
本文主要阐述了LIGA技术的工艺过程，包括X射线深层光刻、微电铸和微复制工艺。
He believes this would be easier to carry out than the lithography currently used to manufacture SQUIDs because it would require no photosensitive mask and no chemicals to wash away that mask.
他相信，制造SQUID时，这项技术的应用比现代的印刷集成电路技术要容易，因为它不需要有光敏涂层，也不再需要化学物质洗去涂层。
Mask fabrication is a key technique of scattering with angular limitation projection electron-beam lithography (SCALPEL).
掩模制作是电子束散射角限制投影光刻(SCALPEL)的关键技术。
The fabrication procedure of the mask and results of the deep X ray lithography are given.
给出了该掩模设计制作工艺过程及深x射线光刻结果。
For the removal of residual layer after template is released during nanoimprint lithography, a new UV-nanoimprint technology without residual layer based on photolithography mask was proposed.
针对纳米压印光刻技术中压印脱模后的留膜去除问题，提出了一种基于光刻版的无留膜紫外纳米压印技术。
Kohler illumination was used in proximity lithography, and a flys eye lens was adopted to form multi-point source in order to uniform the light intensity on the mask plane.
接近式光刻中一般采用柯勒照明系统，并采用蝇眼透镜形成多点光源均匀掩模面的光场分布。
An EUV Lithography mask, a fabrication method, and use method thereof is provided.
本发明提供了一种EUV光刻掩模、其制造方法与其使用方法。
Three solutions of optimization of experimental parameters, adding beam mask and using etching technologies for improving atom lithography quality are presented.
提出了优化实验参数、增加束掩模和利用刻蚀技术三种改善原子光刻实验的方法。
In synchrotron radiation X-Ray lithography, distortion of mask is caused by its initial tension, stress and inhomogeneous thermal effect.
在同步辐射X射线光刻中，由于掩模的初始张应力和掩膜的非均匀受热将使掩模产生热畸变。
Electron beam lithography machine is the key instrument for mask making and research of nanometer device.
电子束曝光技术是掩模版制作和纳米器件研究的主要手段。
The fabrication of X-ray stencil silicon mask and its application in X-ray deep lithography are presented in this paper.
阐述了X射线镂空硅掩模的研制及其在同步辐射深层光刻中的应用。
In the nanoparticle array synthesized by taking the colloid crystal as the lithography mask, the shapes, sizes, spacing and even compositions of the particles can be controlled easily.
悬浮液中的胶体球在一定条件下能够自组装成二维胶体晶体，以此为掩膜可合成纳米颗粒阵列体系，其颗粒形状、尺寸以及间距等参数易于控制。
In the nanoparticle array synthesized by taking the colloid crystal as the lithography mask, the shapes, sizes, spacing and even compositions of the particles can be controlled easily.
悬浮液中的胶体球在一定条件下能够自组装成二维胶体晶体，以此为掩膜可合成纳米颗粒阵列体系，其颗粒形状、尺寸以及间距等参数易于控制。
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