Magnetron sputtering process has widely been applied to thin film preparation, during which, the quality of thin film is affected badly by the current stability of target.
磁控溅射技术在薄膜制备领域的应用十分广泛，而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。
With the view of the application in factory, the process of tin decorative coating coated by magnetron sputtering coater is emphatically discussed in this paper.
本文从工厂应用的角度着重讨论磁控溅射镀膜机镀氮化钛装饰膜的工艺问题。
The technology of magnetron sputtering is an important method of preparing new materials in modern times, especially in the process of preparation of films.
磁控溅射技术是现代材料制备的重要方法之一，特别是在薄膜的制备过程中显得更为重要。
The kinetic process of reactive magnetron sputtering has been studied.
研究了反应磁控溅射的动力学过程。
The application and features of vaccum strip coating processes such a thermal jet evaporation, magnetron sputtering, electron-beam evaporation and plasma enhanced EB evaporation process were reviewed.
介绍了新一代连续带钢镀膜技术-真空镀膜的工艺特点及应用现状。
Aluminum film on uranium is prepared using magnetron sputtering with and without circulated argon ion bombardment process.
以磁控溅射沉积方法，采用循环氩离子轰击镀和未循环轰击镀工艺在金属铀上制备了铝薄膜。
The back ohmic contact resistance of Al-BSF by DC magnetron sputtering is downtrend with the annealing temperature increasing, and less than that by the screen printing process.
溅射工艺制备出的铝背场接触电阻随退火温度升高呈下降趋势且溅射工艺的接触电阻比印刷工艺更小。
The back ohmic contact resistance of Al-BSF by DC magnetron sputtering is downtrend with the annealing temperature increasing, and less than that by the screen printing process.
溅射工艺制备出的铝背场接触电阻随退火温度升高呈下降趋势且溅射工艺的接触电阻比印刷工艺更小。
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