Magnetron Sputtering Technology has been applied in the field of film preparing widely, however, the quality of the film is influenced by stability of target current badly.
磁控溅射技术在薄膜制备领域的应用十分广泛，而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。
Magnetron sputtering process has widely been applied to thin film preparation, during which, the quality of thin film is affected badly by the current stability of target.
磁控溅射技术在薄膜制备领域的应用十分广泛，而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。
A novel method to drive magnetron by constant voltage-constant current technique is proposed.
提出了用恒压-恒流技术驱动磁控管的新方法。
Using beam emission models, the influence to the magnetron characteristics by the cathode current destiny can be obtained.
利用磁路电子注发射方式针对不同的阴极发射电流进行了动态模拟，得到了不同发射电流条件下磁控管的工作特性。
An alternative current medium frequency pulsed magnetron sputtering cathode power supply was introduced.
本文介绍了一种中频交流脉冲式磁控溅射靶极电源。
TiO2 thin films were deposited on glass and quartz substrates, respectively, using the direct current reactive magnetron sputtering method.
采用直流磁控反应溅射法，在玻璃和石英基体上制备了TiO2薄膜。
TiO2 thin films were deposited on glass and quartz substrates, respectively, using the direct current reactive magnetron sputtering method.
采用直流磁控反应溅射法，在玻璃和石英基体上制备了TiO2薄膜。
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