• The invention discloses a multi-element high-temperature resistant anti-shock magnetron cathode which comprises tungsten, thorium, rhenium and potassium.

    本发明公开了一种多元素耐高温抗震磁控管阴极,由钨、钍、铼、钾组成。

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  • Magnetron has filamentary cathode with small time hearting the shielded cathodic site liquid and air cooling and also the filter built-in by radio.

    该磁控管具有加热时间短的阴极,屏蔽阴极,液体和空气冷却,内建无线电滤波。

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  • The study showed that the maxim secondary emission coefficient of rare earth molybdenum cathode materials was 2.45, which meet the requirement (>2.0) of magnetron to the cathode materials.

    研究结果表明,稀土钼次级发射材料的阴极试样的最大次级发射系数达到2.45,满足了磁控管对阴极材料的次级发射系数2.0以上的应用要求。

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  • Using beam emission models, the influence to the magnetron characteristics by the cathode current destiny can be obtained.

    利用磁路电子注发射方式针对不同的阴极发射电流进行了动态模拟,得到了不同发射电流条件下磁控管的工作特性。

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  • The invention relates to a method for operating a magnetron sputter cathode, in particular a tube cathode or several tube cathodes forming an array.

    本发明涉及一种用于操作磁控管溅射阴极、特别是阴极管或形成 一个阵列的几个阴极管的方法。

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  • The utility model relates to a semi-circular column magnetic control sputtering cathode, belonging to a sputtering source component of a magnetron sputtering device.

    一种半圆柱磁控溅射阴极,属于磁控溅射装置中的溅射源部件。

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  • An alternative current medium frequency pulsed magnetron sputtering cathode power supply was introduced.

    本文介绍了一种中频交流脉冲式磁控溅射靶极电源。

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  • The plasma can be 4 generated by hot-cathode discharge or RF discharge of gas. In addition, the device has four metal plasma sources, two magnetron sputtering targets, cold and hot target supports.

    真空室内的气体等离子体可由热灯丝或射频放电产生,4另外还配置了4个金属等离子体源、两套磁控溅射靶和冷却靶台。

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  • The plasma can be 4 generated by hot-cathode discharge or RF discharge of gas. In addition, the device has four metal plasma sources, two magnetron sputtering targets, cold and hot target supports.

    真空室内的气体等离子体可由热灯丝或射频放电产生,4另外还配置了4个金属等离子体源、两套磁控溅射靶和冷却靶台。

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