We employ the magnetic sputtering method to deposit amorphous tungsten films and investigate their thermal annealing process.
对使用磁控溅射法沉积的钨薄膜进行了热退火研究。
The system include pulse cathodic arc ion deposition, direct current cathodic arc ion deposition, magnetic sputtering and electronic beam evaporation technologies.
该系统集脉冲阴极弧离子镀、直流阴极弧离子镀、磁控溅射和电子束蒸发等镀膜工艺以及气体和金属离子注入于一体。
Physical method, including thermal evaporation and magnetic sputtering, and chemical coating method are applied to prepare organic-inorganic composite chromotropic film.
用热蒸发和磁控溅射的物理镀膜方法和溶胶凝胶化学涂布的方法相结合制备了有机和无机复合纳米光学变色薄膜。
The utility model relates to a semi-circular column magnetic control sputtering cathode, belonging to a sputtering source component of a magnetron sputtering device.
一种半圆柱磁控溅射阴极，属于磁控溅射装置中的溅射源部件。
The invention relates to a magnetic confinement magnetron sputtering method and a magnetron sputtering device prepared by use of the same.
本发明涉及一种磁约束磁控溅射方法及利用该方法制备的磁控溅射装置。
The utility model belongs to a magnetic control sputtering film coating technology and relates to a magnetic control sputtering device in particular.
本实用新型属磁控溅射镀膜技术，具体涉及一种磁控溅射装置。
The results show that the sputtering process factors have large effect on the compositions and magnetic properties.
结果表明，溅射工艺因素对薄膜的成份和磁性能有较大的影响。
A series of giant positive magnetoresistance of magnetic multilayer structure were fabricated by ion-beam sputtering in high vacuum with applied magnetic field and treatment.
采用离子束溅射方法制备了正巨磁电阻多层膜，在制备过程中采用外加磁场和退火处理。
The transverse component of magnetic flux intensity is pivotal that affect the utilization rate of target material and quality of deposition film as well as the instability of the sputtering process.
利用有限元理论对靶表面磁通量密度的横向分量进行了模拟分析。
The transverse component of magnetic flux intensity is pivotal that affect the utilization rate of target material and quality of deposition film as well as the instability of the sputtering process.
利用有限元理论对靶表面磁通量密度的横向分量进行了模拟分析。
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