In the manufacture process of integrated circuit (IC), lithography occupy a very important step, and the quality of photomask used in lithography affects the yield of LSI.
光刻是大规模集成电路生产流程中十分关键的一环，而光刻中使用的掩模的质量对大规模集成电路的成品率有很大的影响。
At the same time, to effectively lower power consumption, it should be noted not only considering LSI as a whole but also improving the design of system structure, its logic and circuit.
同时指出，必须既从LSI整体出发，也从体系结构、逻辑、电路各方面做起才能有效降低系统功耗。
At last, typical circuits and circuit techniques applied to telecommunication LSI/VLSI are provided.
并通过实例说明通信LSI/VLSI中典型的电路和技术。
At last, typical circuits and circuit techniques applied to telecommunication LSI/VLSI are provided.
并通过实例说明通信LSI/VLSI中典型的电路和技术。
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