Electron beam lithography machine is the key instrument for mask making and research of nanometer device.
电子束曝光技术是掩模版制作和纳米器件研究的主要手段。
In this paper, a unique hoisting structure of laser positioning stage system for electron-beam lithography machine is described.
本文介绍了电子束曝光机激光定位工作台的一种新型吊装结构。
The laser Positioning stage system with hoisting structure which is being developed is the main part of the Electron - beam Lithography Machine.
正在研制的激光定位吊装结构工作台系统是电子束曝光机的主要组成部分。
The experimental results of SDS-3 Ebeam lithography machine show that the aberrations of the electrostatic deflection are in the same order of the magnetic deflection.
由SDS-3电子束曝光机试验结果表明，复合静电偏转可以达到磁偏转相似的像差水平。
Based on the SDS-3 E-beam lithography machine, the electrostatic deflection of the folded plate structure was used instead of the electrostatic deflection of the plate.
以SDS - 3电子束曝光机为基础，用折板结构静电偏转替代直板结构静电偏转，探讨了电子束曝光机折板静电偏转场的电子轨迹与电位分布应满足的要求。
The paper introduces the application of inverter in the reform of homemade single - double-color singleton paper lithography machine, followed with some functional demands for inverter.
本文主要介绍了变频器在国产单双色单张纸平版印刷机改造中的应用，以及对变频器的一些功能的要求。
An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed.
本发明公开一种设备和方法，用于在更换平板印刷机(10)中工件(208)期间，将浸没流体(212)保持在邻接投射透镜(16)的间隙中。
An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed.
本发明公开一种设备和方法，用于在更换平板印刷机(10)中工件(208)期间，将浸没流体(212)保持在邻接投射透镜(16)的间隙中。
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