Plasma source ion implantation is a new non-line of sight ion implantation technique for surface modification of materials.
等离子体源离子注入技术是一种新型的非视线的离子注入材料表面改性技术。
The ECR ion source, beam line from ECR to SFC and electrostatic inflector have been designed and installed to increase ion species and beam intensity.
安装了ECR离子源及其外注入系统后，增加了离子种类、提高了束流强度。
The ECR ion source, beam line from ECR to SFC and electrostatic inflector have been designed and installed to increase ion species and beam intensity.
安装了ECR离子源及其外注入系统后，增加了离子种类、提高了束流强度。
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