The calculative method of the large field projection lithography lens is presented, and on the distortion measuring setup which is accomplished, distortion measurement of 8 inch wafer is completed.
提出了针对大视场投影光刻物镜畸变的计算方法，并在完成的畸变特性测量装置上进行了8英寸的硅片测量。
The calculative method of the large field projection lithography lens is presented, and on the distortion measuring setup which is accomplished, distortion measurement of 8 inch wafer is completed.
提出了针对大视场投影光刻物镜畸变的计算方法，并在完成的畸变特性测量装置上进行了8英寸的硅片测量。
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