The Langmuir double probe system based on Virtual Instrument was used to diagnose arc ion plating plasmas.
本文利用基于虚拟仪器的朗缪尔双探针系统对电弧离子镀等离子体进行了诊断研究。
The results obtained have been compared with those of the classical Langmuir double probe method, being quite close to each other.
并与传统的朗缪尔双探针法作比较。 两种方法测试结果颇相符合。
The characteristic of spatial distribution of plasma ion density in reaction chamber were diagnosed by a Langmuir double probe, and the effect of Ar pressure and RF power were also investigated.
利用朗缪尔静电双探针诊断了蒸发镀膜装置反应室内等离子体密度及分析其分布规律，并分析了气压和功率对等离子体分布的影响。
The characteristic of spatial distribution of plasma ion density in reaction chamber were diagnosed by a Langmuir double probe, and the effect of Ar pressure and RF power were also investigated.
利用朗缪尔静电双探针诊断了蒸发镀膜装置反应室内等离子体密度及分析其分布规律，并分析了气压和功率对等离子体分布的影响。
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