High quality ITO transparent conductive film was prepared by reactive low voltage ion plating technique, which is different to the most common sputtering method to deposit ITO film.
溅射镀膜方法是制备ito透明导电膜最常用也是实验研究最多的方法。
A transparent conductive ITO anti-reflection layer is generated on a top layer of the amorphous silicon thin film sub-battery.
在非 晶硅薄膜子电池的顶层上生成有透明导电的ITO防反射层。
A transparent conductive ITO anti-reflection layer is generated on a top layer of the amorphous silicon thin film sub-battery.
在非 晶硅薄膜子电池的顶层上生成有透明导电的ITO防反射层。
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