Objective: to discuss the feasibility of two-dimensional ion chamber array in daily quality assurance of accelerator.
目的：探讨应用二维电离室矩阵在加速器日常质量保证中的可行性。
A transverse field gas ionization chamber for particle identification at the Radioactive ion Beam Line in Lanzhou (RIBLL) is described.
描述了一种将用于兰州放射性束流线较重离子鉴别的多阳极横向场电离室。
The technique of soft X-ray ion chamber includes the measurement of the ion current as a function of rare gas pressure in the ion chamber.
软X线稀有气体电离室作为软X线波段绝对探测器，是通过测量光电离子流得出光谱辐射强度。
The characteristic of spatial distribution of plasma ion density in reaction chamber were diagnosed by a Langmuir double probe, and the effect of Ar pressure and RF power were also investigated.
利用朗缪尔静电双探针诊断了蒸发镀膜装置反应室内等离子体密度及分析其分布规律，并分析了气压和功率对等离子体分布的影响。
A target chamber for ion implantation and in-situ electrical measurement at temperatures variable between 77-800k is presented.
本文介绍了一个在77- 800k范围可变温度下进行离子注入和就地电学测量的靶室。
The influence of chamber pressure, gas flow rate and RF power on micro loading effect in reactive ion etch of silicon dioxide is researched.
对二氧化硅反应离子刻蚀中反应室压力，刻蚀气体流量和射频功率等因素对刻蚀速率和刻蚀均匀性的影响进行了研究。
The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。
Vertical scanner is the supporting part of a series process ion implanter, which transfer high speed movement from outside of the chamber to the target inside.
垂直扫描机构是单晶片离子注入机靶盘的支撑部件，起着将高速直线运动从靶室外传递到靶盘的作用。
In this paper, ion-exchange membrane used for EDI is studied, and flow field distribution modeling of dilute chamber with computational fluid dynamics (CFD) software is studied for the first time.
本文主要对EDI设备中的离子交换膜进行研究，并首次采用计算流体力学(CFD)软件对淡水室隔板的流场分布进行模拟。
An exemplary ion source for creating a stream of ions has an aluminum alloy arc chamber body that at least partially bounds an ionization region of the arc chamber.
本发明公开了一种用于产生离子流的示例性离子源，所述离子源具有至少部分地界定电弧室的离子化区的铝合金电弧室主体。
An exemplary ion source for creating a stream of ions has an aluminum alloy arc chamber body that at least partially bounds an ionization region of the arc chamber.
本发明公开了一种用于产生离子流的示例性离子源，所述离子源具有至少部分地界定电弧室的离子化区的铝合金电弧室主体。
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