Ion sputtering yields on t? Ti target are numerically calculated with TRIM program.
应用TRIM程序模拟了离子在氚钛靶上的溅射产额。
Ion extraction and collecting character under different voltage, the relation of collecting time with shield stripping, and collision and sputtering effect were simulated.
模拟了不同外加电压下几种静电场收集模型的离子引出收集特性、引出时间与屏蔽剥离的关系，以及碰撞和溅射效应。
The newly designed films of green HeNe laser have been coated by making use of ion beam sputtering deposition, and the measured results have been given out.
利用离子溅射镀膜技术镀制了所设计的膜片并且给出了测量结果。
The surface cleaning action, caused by the cathode sputtering phenomenon in ion bombardment brazing in glow discharge is investigated in this paper.
本文研究了辉光放电离子轰击钎焊时阴极溅射现象对工件表面的净化作用。
However, the predominant process of secondary ion sputtering is kinetic sputtering, which closely related to the momentum deposition on the target surface (nuclear stopping power).
而主导二次离子溅射的过程是动能溅射，它与靶表面的动量沉积(核能损)过程密切相关。
The system include pulse cathodic arc ion deposition, direct current cathodic arc ion deposition, magnetic sputtering and electronic beam evaporation technologies.
该系统集脉冲阴极弧离子镀、直流阴极弧离子镀、磁控溅射和电子束蒸发等镀膜工艺以及气体和金属离子注入于一体。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
The sputtering yield per cluster ion is higher than that for monomer ion by a factor of more than 100.
离化团束的溅射产额比之单体离子束高100倍以上。
The results about the research on the characters of ion beam sputtering show that grid voltage and sputtering gas pressure have great influences on ion beam distribution and current.
溅射特性研究结果表明：屏极电压和溅射气压对离子束均匀性和束流密度影响显著；
Dynamic TCIS code may investigate complex problems concerning three-elemental targets bombarded by energetic ions, such as the ion implantation at large dose, preferential sputtering, ion mixing, etc.
动态tcis可以研究离子束轰击三元靶的复杂问题：如大剂量离子注入、择优溅射和界面混合等。
ABSTRACT the application of pulse technique on arc ion plating and magnetron sputtering is summarized in the article.
摘要本文综述了国内外脉冲工艺在电弧离子镀和磁控溅射中的应用。
The ion plating is a new technique combined vacuum evaporation plating with sputtering.
离子镀是真空蒸镀与溅射相结合的新工艺。
The electronic circuitry of the various vacuum protection schemes, which use sputtering ion pump or cold-cathode or hot cathode ionization gauge as sensors, was compared.
分析比较了溅射离子泵、冷阴极电离超高真空计、热阴极电离超高真空计等作为真空保护传感器的不同电子学设计。
There are various methods to obtain antibacterial surface on stainless steels, such as chemical heat treatment, magnetron sputtering, ion implantation, Sol-Gel, and chemical deposition.
制备表面抗菌不锈钢的方法有化学热处理、磁控溅射、离子注入、溶胶-凝胶和化学沉积。
A series of giant positive magnetoresistance of magnetic multilayer structure were fabricated by ion-beam sputtering in high vacuum with applied magnetic field and treatment.
采用离子束溅射方法制备了正巨磁电阻多层膜，在制备过程中采用外加磁场和退火处理。
It is of great importance to improve the properties of DLC films deposited with simultaneous ion bombardment du-ring film growth by ion beam sputtering on graphite target.
在离子束溅射石墨靶淀积dlc膜的同时用离子束轰击，对于拓宽和改善DLC膜的性质有重要意义。
Silicon oxide ion barrier film was successfully fabricated on the input-face of microchannel plate by magnetron sputtering method.
本文利用射频磁控溅射方法，在微通道板输入面上成功地制备出二氧化硅防离子反馈膜。
In ion-beam sputtering deposition and ion-beam aid deposition thin film techniques, ion-beam source is one of the key techniques.
在离子束溅射和离子辅助沉积光学薄膜技术中，离子源是其中最关键的单元技术之一。
The higher sputtering yield would result from multiple collision, lateral sputtering and high density energy deposition of gas cluster ion beam.
气体离化团束的高溅射产额可能是由于多体碰撞、侧向溅射及高能量密度的照射引起的。
A composite pump was developed which is composed of a non evaporable getter pump and a sputtering ion pump.
研制了一种由非蒸散型消气剂泵与冷阴极溅射离子泵组成的复合泵。
Aluminum film on uranium is prepared using magnetron sputtering with and without circulated argon ion bombardment process.
以磁控溅射沉积方法，采用循环氩离子轰击镀和未循环轰击镀工艺在金属铀上制备了铝薄膜。
This paper mainly deals with the relationship between negative bias of substrate and component phases of magnetron-sputtering ion plated aluminium film of A3 steel.
本文主要论述基板负偏压与A 3钢基体磁控溅射离子镀铝膜相组成的关系。
The magnetron-sputtering ion plating aluminum film is not simply an out- covering layer of a single substance, but an alloy film containing both aluminum and copper.
磁控溅射离子镀铝膜不是简单的单质外接铝膜，而是铜和铝组成的合金膜。
The invention relates to a device for improving utilization rate of a high vacuum ion beam sputtering target material.
本发明涉及一种高真空离子束溅镀靶材利用率增强装置。
Metallic antimony thin film was deposited by magnetron sputtering and it was investigated as anode materials for lithium-ion batteries.
采用磁控溅射方法制备金属锑薄膜，并把它作为锂离子二次电池负极进行研究。
Metallic antimony thin film was deposited by magnetron sputtering and it was investigated as anode materials for lithium-ion batteries.
采用磁控溅射方法制备金属锑薄膜，并把它作为锂离子二次电池负极进行研究。
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