The invention also relates to a method of using said implanter.
本发明还涉及使用所述注入机的方法。
The invention relates to a wafer clamp for an ion implanter which belongs to the field of semiconductor equipment manufacture.
本发明涉及一种离子注入机用的晶片夹，属于半导体装备制造领域。
Introduced the configuration of typical ion implanter, analyzed the importance of the implantation mechanical scanning technology.
简单介绍了典型离子注入机的组成，分析了离子注入机中扫描技术的重要性。
Vertical scanner is the supporting part of a series process ion implanter, which transfer high speed movement from outside of the chamber to the target inside.
垂直扫描机构是单晶片离子注入机靶盘的支撑部件，起着将高速直线运动从靶室外传递到靶盘的作用。
An implanter without ion mass analyzer was used to fabricate thin SOI materials by low energy and low dose water ions implantation instead of conventional SIMOX.
采用无质量分析器的离子注入机，以低能量低剂量注水的方式代替常规SIMOX注氧制备soi材料。
The invention relates to an ion implanter (imp) comprising a pulsed plasma source (SPL), a substrate support plate (PPS) and a power supply (ALT) for said plate.
本发明涉及离子注入机imp，包括脉冲等离子体源spl、衬底支承台PPS和所述台的电源alt。
An analyzer magnet and ion implanter including the magnet pole are also provided so that a method of improving low energy ion beam space charge neutralization in an ion implanter is realized.
本发明亦提供一分析器磁铁以及包括前述磁极的离子布植机，因此实现了一改良一离子布植机中的低能量离子束空间电荷中和的方法。
An analyzer magnet and ion implanter including the magnet pole are also provided so that a method of improving low energy ion beam space charge neutralization in an ion implanter is realized.
本发明亦提供一分析器磁铁以及包括前述磁极的离子布植机，因此实现了一改良一离子布植机中的低能量离子束空间电荷中和的方法。
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