For a high plasma density and low applied voltage, the steady-state sheath thickness is more or less insensitive to variations in the spherical radius, but it is very sensitive under other conditions.
当等离子体密度较高、注入电压较低时，稳态鞘层厚度对于靶体半径的变化极不敏感。
For a high plasma density and low applied voltage, the steady-state sheath thickness is more or less insensitive to variations in the spherical radius, but it is very sensitive under other conditions.
当等离子体密度较高、注入电压较低时，稳态鞘层厚度对于靶体半径的变化极不敏感。
应用推荐