It is found that the sputtering yield of kinetic impact is increased by HCIs and the potential sputtering (PS) could be induced by impact of HCIs.
实验结果表明高电荷态离子能够增加动能溅射；同时高电荷态离子入射能够引起势能溅射。
It is found that the sputtering yield of kinetic impaction is increased by HCIs and the potential sputtering (PS) could be induced by impaction of HCIs.
实验结果表明高电荷态离子能够增加动能溅射；同时高电荷态离子入射能够引起势能溅射。
It is found that the sputtering yield of kinetic impaction is increased by HCIs and the potential sputtering (PS) could be induced by impaction of HCIs.
实验结果表明高电荷态离子能够增加动能溅射；同时高电荷态离子入射能够引起势能溅射。
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