Plasma chemical vapor deposition in silane radio frequency glow discharge is a main fabrication technology of hydrogenated amorphous silicon (a-Si: h) films.
射频辉光放电硅烷等离子体化学汽相沉积是制备氢化非晶硅薄膜的主要工艺技术。
Multiple logistic regression analyses were used to determine the association between usual number of hours of sleep during a 24-h period and si and SA (past 12 months and lifetime).
应用多元逻辑回归分析方法确定24小时的一个周期内常规睡眠的小时数与SI和SA(过去12个月和一生)之间的关系。
This paper firstly gives a brief review about the history of amorphous semiconductor and the rapid progress in hydrogenated amorphous silicon (a-Si: h) film in recent years.
本文首先简要地回顾了非晶半导体的历史和近年来含氢非晶硅瞋的迅速进展。
This article has summarized the applications of the hydrogenated amorphous silicon (a-Si: h) to photoreceptor of the electrophotography.
本文概述了氢化非晶硅作为静电复印感光膜的应用。
This article has summarized the applications of the hydrogenated amorphous silicon (a-Si: h) to photoreceptor of the electrophotography.
本文概述了氢化非晶硅作为静电复印感光膜的应用。
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