Selfnegative bias on insulate substrate surface of rf glow discharge plasma reactors is studied theoretically. The mathematical analysis has been obtained by equivalent circuit method.
讨论了高频辉光放电等离子体系统中绝缘衬底表面的自负偏压问题，用等效电路方法给出了自负偏压的数学解析。
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
A new method for testing the acid etching depth of WC-Co cemented carbide by flame atomic absorption spectrometry and glow discharge spectrometry has been studied.
研究了原子吸收光谱法和辉光放电光谱仪定量测定硬质合金去钴深度的新技术。
A new method for testing the acid etching depth of WC-Co cemented carbide by flame atomic absorption spectrometry and glow discharge spectrometry has been studied.
研究了原子吸收光谱法和辉光放电光谱仪定量测定硬质合金去钴深度的新技术。
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