Photoresist coating preparation and baking; Thin film preparation.
光刻胶的旋涂与烘烤，薄膜材料制备。
Uniformity of the photoresist film, adhesiveness between underlay and glue film, exposal and develop condition of high thickness difference are all solved in the thesis.
在厚胶光刻工艺中重点解决了胶膜厚度的均匀性、胶膜与衬底的粘附性、大厚度差胶层的曝光、显影条件等的优化问题。
The effects of the photoresist film overlays on the propagation of modes in glass planar optical waveguides by silver-ion exchange are measured.
测量并归纳了负胶介质薄层对银离子交换玻璃平面波导传播特性影响的实验趋势。
However, some problems, such as film crack and falling off from the substrate, appear during the subsequent processing because of the high internal stress of SU-8 photoresist.
然而SU - 8胶在工艺过程中会产生很大的内应力，导致在后续的工艺过程中出现胶体开裂，甚至从基底上脱落等现象。
The invention discloses a method for fabricating CMOS image sensor, capable of increasing the adhesion between an interlayer insulating film and a photoresist pattern.
公开一种制造CMOS图像传感器的方法，其能提高层间绝缘膜与光致抗蚀剂之间的粘附力。
The photo-oxidation reaction of poly (styrene-sulfone)-a novel positive deep UV photoresist including film and solution has been studied by fluorescence spectra.
利用荧光光谱研究了聚苯乙烯砜正性远紫外抗蚀剂薄膜和溶液的光氧化反应。
The photo-oxidation reaction of poly (styrene-sulfone)-a novel positive deep UV photoresist including film and solution has been studied by fluorescence spectra.
利用荧光光谱研究了聚苯乙烯砜正性远紫外抗蚀剂薄膜和溶液的光氧化反应。
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