A scan field distortion correction function fore-beam exposure system is deduced on the basis of the plane field alternation principle, and a simulative fruit is given by computer.
根据平面区域变换的原理，导出电子束曝光机扫描场的畸变校正函数，并给出计算机模拟校正的结果。
The present results not only can help to optimize the exposure conditions in Electron Beam Lithography, but also supply more accurate data for proximity effect correction.
本文的模拟结果不仅能为高能电子束光刻工艺优化曝光条件、降低邻近效应提供理论指导，而且能为进一步的邻近效应的校正提供更精确的数据。
The main parts include density adjustment, exposure adjustment, pre-printing adjustment and uniformity correction.
其主要环节包括密度校正、曝光量校正、均匀性校正、印前预校色等。
All shots here are made by physical cameras because of the need of real exposure, vertical correction, etc...
所有镜头都用的是物理摄像机，因为可以取得一个真实的曝光，垂直修正等等。
All shots here are made by physical cameras because of the need of real exposure, vertical correction, etc...
所有镜头都用的是物理摄像机，因为可以取得一个真实的曝光，垂直修正等等。
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