The fabrication process of a compact planar waveguide etched-grating(EDG) demultiplexer based on silicon-on-insulator(SOI) is studied.
研究了基于绝缘材料上的硅（SOI）材料的平面波导刻蚀光栅分波器的主要制作工艺。
The fabrication process of a compact planar waveguide etched-grating(EDG) demultiplexer based on silicon-on-insulator(SOI) is studied.
研究了基于绝缘材料上的硅（SOI）材料的平面波导刻蚀光栅分波器的主要制作工艺。
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