A large-area nanopillar fabrication method by nanoparticle monolayer as an etch mask is displayed, which can be used in kinds of nano film fabrication .
最后，本文提供了一种简单、方便、有效且直径可控的，在硅基底上大面积形成纳米点阵或纳米柱阵列的纳米加工方法。
Last, a technique known as anisotropic ion beam milling (IBM) is used to etch through the mask to make an array of holes, creating the nanoporous metal.
最后，采用各项异性的离子束(IBM)加工技术可以通过掩膜来蚀刻孔阵，以制成纳米多孔金属材料。
Last, a technique known as anisotropic ion beam milling (IBM) is used to etch through the mask to make an array of holes, creating the nanoporous metal.
最后，采用各项异性的离子束(IBM)加工技术可以通过掩膜来蚀刻孔阵，以制成纳米多孔金属材料。
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