Some Suggestions to improve uniformity of the periphery of electrostatic deflection field are outlined in the discussion.
讨论中提出了一些改善静电偏转场边缘区均匀性的建议。
The distributions of equipotential surface in electrostatic deflection system under different cases are given in this paper.
本文给出了不同情况下静电偏转系统中的等位面分布。
The experimental results of SDS-3 Ebeam lithography machine show that the aberrations of the electrostatic deflection are in the same order of the magnetic deflection.
由SDS-3电子束曝光机试验结果表明，复合静电偏转可以达到磁偏转相似的像差水平。
Based on the SDS-3 E-beam lithography machine, the electrostatic deflection of the folded plate structure was used instead of the electrostatic deflection of the plate.
以SDS - 3电子束曝光机为基础，用折板结构静电偏转替代直板结构静电偏转，探讨了电子束曝光机折板静电偏转场的电子轨迹与电位分布应满足的要求。
Based on the SDS-3 E-beam lithography machine, the electrostatic deflection of the folded plate structure was used instead of the electrostatic deflection of the plate.
以SDS - 3电子束曝光机为基础，用折板结构静电偏转替代直板结构静电偏转，探讨了电子束曝光机折板静电偏转场的电子轨迹与电位分布应满足的要求。
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