The first was to use a thinner resist layer, to minimize electron scattering.
第一项是使用更薄的光阻胶涂层以减小电子的散射。
Electron - beam lithography with a novel multilevel resist structure defines the pattern.
采用新型的多层抗蚀剂结构的电子束光刻来形成图形。
How to plot the figure of electron track, the figure of the energy absorbed by resist, the profile of the developed resist.
画电子散射轨迹图、抗蚀剂能量吸收图、抗蚀剂显影图。
The most accurate ray-tracing model is used firstly on the development simulation of resist exposed by electron beam.
在电子束曝光胶图形的三维显影模拟工作中，首次使用了最精确的三维线踪模型。
And by the means of silicide, resist layer and aluminium multilayer metal lines, the questions of ohmic-contact and A1 electron mobility are resolved.
采用硅化物阻挡层和A1多层金属布线方法，解决了欧姆接触和铝的电迁移问题。
And by the means of silicide, resist layer and aluminium multilayer metal lines, the questions of ohmic-contact and A1 electron mobility are resolved.
采用硅化物阻挡层和A1多层金属布线方法，解决了欧姆接触和铝的电迁移问题。
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