The electron beam ion trap(EBIT) and the electron ion source(EBIS) are new instruments for the study of X-ray produced by very highly-charged ions when they interact with free electrons.
利用电子束离子源（EBIS）或者电子束离子陷阱（EBIT）产生的慢速高电荷态重离子束轰击金属靶面，离子束与靶面作用并复合辐射特征X射线；
By means of electron beam evaporation and ion source auxiliary technology, the paper shows the influence of the number of layers on the quality of film polarization beam splitter prism.
采用电子枪蒸镀离子源辅助技术，讨论了薄膜层数对偏振分束棱镜性能的影响。
By means of electron beam evaporation and ion source auxiliary technology, the paper shows the influence of the number of layers on the quality of film polarization beam splitter prism.
采用电子枪蒸镀离子源辅助技术，讨论了薄膜层数对偏振分束棱镜性能的影响。
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