• The laser Positioning stage system with hoisting structure which is being developed is the main part of the Electron - beam Lithography Machine.

    正在研制激光定位吊装结构工作台系统电子束曝光主要组成部分

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  • The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam.

    电子束曝光偏转系统控制电子束偏转扫描

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  • In this paper, a unique hoisting structure of laser positioning stage system for electron-beam lithography machine is described.

    本文介绍了电子束曝光激光定位工作台一种新型吊装结构

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  • The composition, principle and working procedure of the application software of EBES-40A electron beam Lithography system are introduced.

    本文简要地介绍了圆形电子束曝光机应用软件结构工作原理工作过程

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  • DY2001A Electron Beam Lithography System (EBLS) is developed as a practical miniature EBLS.

    DY 2001a型电子束曝光机作为实用化的小型曝光系统研制的。

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  • DY2001A Electron Beam Lithography System (EBLS) is developed as a practical miniature EBLS.

    DY 2001a型电子束曝光机作为实用化的小型曝光系统研制的。

    youdao

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