A novel lithiation of electrochromic films is proposed.
提出了一种新的电致变色薄膜的锂化方法。
WO_ (3) electrochromic films were prepared on ITO glass substrates by the sol-gel method.
采用溶胶-凝胶法，在氧化铟锡(ito)玻璃基质上制备氧化钨电致变色薄膜。
Nickel oxide films are now considered to have excellent electrochromic performance, which can be used as electrochromic films and also as the ion storage electrode in electrochromic devices.
氧化镍薄膜是目前发现的性能最好的电致变色材料之一，它不仅能够用作电致变色薄膜，还可以作为电致变色器件的离子存储电极。
The STM results disclose that electrochromic reaction make a great change in the morphology of films.
STM分析得知，电致变色反应使薄膜的表面形貌也发生了剧烈的变化。
WO_3 is probably the most promising one of various electrochromic materials due to its excellent electrochromic properties, especially the amorphous tungsten oxide films.
非晶态WO_3薄膜具有优良的电致变色特性，被认为是最有发展前景的功能材料之一。
The experiment indicates that the refractive index of the films made by this way increases from 1.76 to 1.89. The films have good electrochromic properties and improved stability.
实验表明：采用本方法，可使薄膜的折射率增大（从1.76增加至1.89） ，同时保持了薄膜良好的电致变色性能，增强了薄膜的稳定性。
WO_3 electrochromic thin films doped with Co were prepared by pulsed electrodeposition, and the mechanism of this method was also explored.
利用脉冲电沉积法制备了掺钴氧化钨电致变色薄膜，并探讨了该方法的机理。
WO_3 electrochromic thin films doped with Co were prepared by pulsed electrodeposition, and the mechanism of this method was also explored.
利用脉冲电沉积法制备了掺钴氧化钨电致变色薄膜，并探讨了该方法的机理。
应用推荐