In this dissertation, extensive researches on the electrical and field emission properties of nano-carbon films prepared by hot filament chemical vapor deposition (HFCVD).
本文利用热灯丝化学气相沉积法(HFCVD)制备了纳米量级的碳薄膜材料，对它的电学性质及场发射性质进行了详细的研究。
The electrical and optical properties of the films were found to depend on the oxygen concentration in the gas mixture and the substrate temperature as well as the post-deposition heat treatment.
实验结果表明，这种薄膜的电学和光学性质依赖于混合气体中的氧浓度、衬底温度以及沉积后的热处理。
It requires substantially less electrical consumption for deposition and, as a result, less refrigeration for cooling.
电泳本身耗电量少，从而用于冷却的冷量也少。
The forming mechanism of different micro structures fabricated by micro electrical discharge machining (EDM) deposition was studied.
对微细电火花沉积加工中沉积所得不同微细结构的成形机理进行了研究。
Reviewed were the effects of various deposition conditions on microstructural, electrical and optical properties of AlN films grown by magnetron sputtering deposition technology.
综述了各种沉积条件对磁控溅射技术生长氮化铝薄膜的微观结构，电学以及光学性能的影响。
The effects of substrate temperature and post deposition vacuum annealing on structural, electrical and optical properties of ZMO: ga thin films were investigated.
采用各种分析手段研究了沉积温度和真空退火处理对薄膜结构、表面形貌及光电性能的影响。
The optimized parameters of electrical-deposition were experimentally studied, including the deposition voltage and deposition time.
实验研究了电沉积的最佳物理条件，包括沉积电压、沉积时间等。
The effect on the electrical and optical properties is studied as ITO transparent conductive thin films prepared by DC magnetron reactive sputtering technique with different deposition parameters.
论述了高温直流磁控反应溅射法制备ito透明导电薄膜时氧分压、溅射气压和溅射电流等参数对其光电特性的影响。
The effect on the electrical and optical properties is studied as ITO transparent conductive thin films prepared by DC magnetron reactive sputtering technique with different deposition parameters.
论述了高温直流磁控反应溅射法制备ito透明导电薄膜时氧分压、溅射气压和溅射电流等参数对其光电特性的影响。
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