This system is applied to the measurement of microwave ECR plasma inner parameters and proved to work well.
将该系统应用于微波ecr等离子体参数的测定，经实验测试效果较好。
The cleaning of hydrogen and nitrogen ECR plasma on sapphire substrates are carried out in the calibrated temperature system and evaluated by analyzing RHEED image in ECR-PEMOCVD system.
最后讨论了在经过校温的系统上进行蓝宝石衬底的氢氮等离子体清洗实验，并通过RHEED图像评价清洗结果质量。
Principles of microwave ECR plasma technology are introduced briefly. Present development of it'S research and applications in system manufacturing, CVD, PVD and etching is reviewed.
本文简要介绍了微波ECR等离子体技术的原理，评述了近年来这种技术在CVD、PVD、刻蚀等方面的研究和应用的进展。
Principles of microwave ECR plasma technology are introduced briefly. Present development of it'S research and applications in system manufacturing, CVD, PVD and etching is reviewed.
本文简要介绍了微波ECR等离子体技术的原理，评述了近年来这种技术在CVD、PVD、刻蚀等方面的研究和应用的进展。
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