The mechanisms of dissolution inhibition of positive photoresist based on novolak(NVK)-diazonaphthoquinone(DNQ), including(1) the molecular hydrogen bonding interactions between novolak and DNQ;
本文综述了酚醛重氮萘醌正性抗蚀剂的溶解抑制机理，主要包括（1）分子间氢键作用机理；
The mechanisms of dissolution inhibition of positive photoresist based on novolak(NVK)-diazonaphthoquinone(DNQ), including(1) the molecular hydrogen bonding interactions between novolak and DNQ;
本文综述了酚醛重氮萘醌正性抗蚀剂的溶解抑制机理，主要包括（1）分子间氢键作用机理；
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