The dielectric layer (12) is made by a process involving continuous variation of dielectric material deposition conditions to provide a dielectric layer having a gradient of dielectric constant.
介质层 （12）由包括连续变化的介质材料沉积条件的方法制造以提供具有介电常 数梯度的介质层。
Stress gradient decreased as the via diameter, the dielectric constant of ILD or the residual length decreasing, and increased as the line width increasing.
应力梯度随通孔直径、层间介质材料介电常数和铜线余量长度的减小而下降，随线宽减小而上升。
Stress gradient decreased as the via diameter, the dielectric constant of ILD or the residual length decreasing, and increased as the line width increasing.
应力梯度随通孔直径、层间介质材料介电常数和铜线余量长度的减小而下降，随线宽减小而上升。
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