With the rapid development of microelectronics industry, the feature size of CMOS device is scaling down.
随着微电子工业的飞速发展，CMOS器件特征尺寸在不断缩小。
The method has controllable feature and size of the micro particle, simple device and easy operation, and can easily realize industrial mass production.
本发明方法具有微粒形貌与大小可控，装置简单，操作容易，易于实现大规模工业化生产。
The method has controllable feature and size of the micro particle, simple device and easy operation, and can easily realize industrial mass production.
本发明方法具有微粒形貌与大小可控，装置简单，操作容易，易于实现大规模工业化生产。
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