Therefore, inhibiting polyglutamine protein aggregation or deposition would be an important target for HD therapy.
多聚谷氨酰氨的聚集、沉淀可能是该病发病的原因和关键。
Various metal or metal the material composing a target is collide with by electrified ion is brought about the metal atom becoming the free particle deposition surface in mylar above.
各种金属或金属合成靶材被带电离子撞击，造成金属原子成为自由粒子沉积在上面的聚酯薄膜的表面。
Target with higher deposition efficiency could deposit more wafers.
高沉积效率的靶材可制备出更多数目的晶圆。
However, the predominant process of secondary ion sputtering is kinetic sputtering, which closely related to the momentum deposition on the target surface (nuclear stopping power).
而主导二次离子溅射的过程是动能溅射，它与靶表面的动量沉积(核能损)过程密切相关。
We studied the relationship between the films thickness, grain size and deposition parameters, i. e. pulse laser frequency, striking voltage and distance from the target to the substrate.
研究了所制备薄膜的厚度、颗粒度等与薄膜制备过程中激光脉冲频率、引弧电压和靶材—衬底间距等工作参数之间的对应关系。
During deposition process, the temperature of target increases for the bad cooling condition which increase the sputtering rate, so the metallic state sputtering is formed.
分析认为，在大电流、散热不良的情况下，靶面温度升高会极大增高靶材的被溅蚀速率，从而呈现金属态沉积。
Uses: sputtering target, physical vapor deposition, high temperature alloys.
溅射靶材、物理气相沉积、高温合金。
A Robarts' Scientist has generated a target-based primary in vitro cell-based screen for evaluating compounds or peptides affecting scar matrix deposition and remodeling during wound repair.
以靶标和体外细胞学方法为基础的药物筛选系统， 用于璘选影响疤痕间质沉淀及伤口修复的药物。
Using sintered B4C as target material, ternary BCN thin films were synthesized by means of pulsed laser deposition assisted by nitrogen ion beam.
以烧结B4C为靶材料、在氮离子束辅助下用脉冲激光沉积方法制备了三元化合物硼碳氮(BCN)薄膜。
The construction of the target holder was changed so as to keep no other materials included in target surface, thus improving the purity of the films prepared by arc discharge deposition.
通过对靶座结构的改变，使得靶面不再存在其他材质，由此提高了电弧离子镀膜膜层的纯度。
The magnetron sputtering device can effectively overcome the problem that the prior art is low in target material utilization rate and deposition rate.
其可以有效克服现有技术存在的靶材利用率低和沉积速率低的问题。
The transverse component of magnetic flux intensity is pivotal that affect the utilization rate of target material and quality of deposition film as well as the instability of the sputtering process.
利用有限元理论对靶表面磁通量密度的横向分量进行了模拟分析。
Uses: sputtering target, physical vapor deposition, high temperature alloy for high-voltage vacuum switch contacts and precision alloy additives.
用途：溅射靶材、物理气相沉积、高温合金、用于高压真空开关触头及精密合金添加剂。
This paper studies the nucleation mechanism of the target-facing sputtering, and the variation of island-density with such parameters as deposition time and substrate temperature.
本文研究了对向靶溅射薄膜的成核机理。给出了在薄膜的生长初期基板上的岛密度随生长条件（如沉积时间、基板温度）的变化。
The smaller droplet diameter and more symmetrical distributions can improve pesticide target backside deposition effect.
荷电喷雾时，雾滴的粒径愈小分布愈均匀有利于荷电药液在靶标物背部沉积。
The smaller droplet diameter and more symmetrical distributions can improve pesticide target backside deposition effect.
荷电喷雾时，雾滴的粒径愈小分布愈均匀有利于荷电药液在靶标物背部沉积。
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