Some examples should show that the deposition of faceted or ballas diamond is strongly related to the deposition parameters.
一些例子可以说明，多面金刚石或半刚石的沉积与沉积参数有着密切的关系。
In experiment, a series of silicon nitride thin films are prepared on cleaned silicon wafer by varying deposition parameters.
本实验通过系统地改变沉积参数，在经过清洗好的单晶硅片上沉积了一系列的氮化硅薄膜。
And coating materials of laser film, coating design, deposition techniques and ion assisted deposition parameters were researched in-depth.
并对激光膜的镀膜材料、膜系设计、沉积工艺及离子辅助沉积参数等进行了深入研究。
We have discovered that it is possible to tune the stress of a single-layer silicon nitride film by manipulating certain film deposition parameters.
我们已经发现，可以通过操作某些膜沉积参数来调节单层氮化硅膜的应力。
Lots of experiments indicate that the form, structure and properties of silicon nitride thin film prepared by PECVD are related to deposition parameters.
大量的实验研究表明，PECVD氮化硅薄膜的组成、结构及其性能与沉积参数密切相关。
Microcrystalline silicon thin films prepared at different deposition parameters using very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD).
采用甚高频等离子体增强化学气相沉积技术制备了不同衬底温度的微晶硅薄膜。
The images before being processed and after being processed with the software were compared and the droplets deposition parameters being processed can improve the precision of the system.
并对未经软件处理和经过软件处理后的雾滴显微图像进行量化分析比较，经过软件处理后所得到的雾滴沉积状态参数，增加了统计精度。
We studied the relationship between the films thickness, grain size and deposition parameters, i. e. pulse laser frequency, striking voltage and distance from the target to the substrate.
研究了所制备薄膜的厚度、颗粒度等与薄膜制备过程中激光脉冲频率、引弧电压和靶材—衬底间距等工作参数之间的对应关系。
The relationship between hardness of the deposited films and deposition parameters were analysed in detail. Wear resistance and chemical inertness of the deposited films are also studied.
分析了类金刚石薄膜的硬度和工艺参数的关系，讨论了薄膜的耐磨性和化学稳定性。
The effect on the electrical and optical properties is studied as ITO transparent conductive thin films prepared by DC magnetron reactive sputtering technique with different deposition parameters.
论述了高温直流磁控反应溅射法制备ito透明导电薄膜时氧分压、溅射气压和溅射电流等参数对其光电特性的影响。
Actually the drawing of deposition facies diagram is on the basis of integral analysis of various geologic parameters.
实际工作中，沉积相图的绘制是在综合分析各种地质参数的基础上产生的。
The effect of chemical nickel plating parameters on deposition speed and plating quality is discussed.
详细讨论了化学镀镍工艺参数对沉积速度和镀层质量的影响。
Influences of the incident Angle for wave and plasma parameters such as temperature, density and location of resonance layer on wave traces and power deposition distribution were studied.
研究了等离子体温度、密度和共振层位置等参数及波的入射角对波迹和功率沉积分布的影响。
The influence of various experimental parameters on deposition rate film composition and hardness has been studied, Bias is considered as the most effective Darameter.
研究了各种实验参数对沉积速率、薄膜组成及膜层硬度的影响，认为偏压是最具影响的参数。
The main process parameters include hydrogen content in the gas sources, hydrogen plasma catalyst pretreatment, substrate bias, deposition temperature and plasma flow guiding.
主要之制程参数包括气源中之氢气含量、电浆前处理、材偏压、积温度以及电浆导流板之施加。
The effect of technical parameters on deposition rate, hardness and surface roughness of DLC films were researched.
并研究了工艺参数对薄膜沉积速率、硬度和表面粗糙度的影响。
The influence parameters on deposition rate was investigated, and the composition and structure of as-deposited films were characterized by IR, XRD and hardness measurement.
分别考察了载气、沉积温度以及原料配比等工艺参数对沉积速率的影响，并对薄膜的组成、结构及硬度等性能进行了分析。
The trend of the wet deposition between 1987 and 2004 in Beijing city was analyzed by using two parameters, e. g. precipitation acidity and wet deposition fluxes.
通过分析降水酸度和沉降量2个酸沉降控制指标，得出北京市近二十年（1987~2004）湿沉降特征变化趋势。
The presences of defects on the section of castings were explained. The improved process flow and process (parameters) of black deposition were presented.
分析了铸件剖面和断面存在的缺陷，给出了改进后的工艺流程及黑色镀层的工艺参数。
This paper studies the nucleation mechanism of the target-facing sputtering, and the variation of island-density with such parameters as deposition time and substrate temperature.
本文研究了对向靶溅射薄膜的成核机理。给出了在薄膜的生长初期基板上的岛密度随生长条件（如沉积时间、基板温度）的变化。
Process review shows that the substrate material is the key factor for the carbon films deposition, and the parameters of ion energy, pressure and methane ratio are impotent also.
工艺研究结果表明，衬底材料对制备该新型纳米碳膜具有关键作用，离子能量、工作压力及气氛等工艺因素也具有重要作用。
The effects of parameters such as current density, current waveform and organic additives on grain size of deposition layer are described.
阐述了电流密度、电流波形、有机添加剂等工艺参数对沉积层晶粒尺寸的影响；
The concentration and deposition rate of the films are controllable with the optimization parameters on the RFMS-4 sputtering apparatus.
用RFMS-4射频磁控溅射仪制备纳米多层膜技术稳定可靠，在优化工艺条件下能保证薄膜成分和溅射速率的稳定性。
The spacial field during large area diamond film deposition was simulated using this model to study the influence of deposited parameters.
利用该模型对沉积大面积金刚石薄膜的空间场进行了模拟计算，研究了沉积参数对空间场的影响。
The optimized parameters of electrical-deposition were experimentally studied, including the deposition voltage and deposition time.
实验研究了电沉积的最佳物理条件，包括沉积电压、沉积时间等。
The optimized parameters of electrical-deposition were experimentally studied, including the deposition voltage and deposition time.
实验研究了电沉积的最佳物理条件，包括沉积电压、沉积时间等。
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