A new method for layout design based on region constraints was presented to resolve the timing closure problem of physical design in deep sub-micron technology.
针对深亚微米工艺下版图设计中存在的时序收敛问题，提出了一种区域约束的版图设计方法。
In deep sub - micron technology, the mount of the static power catches up with the dynamic power gradually and the standby power is becoming an important factor in low power design.
进入深亚微米工艺后，静态功耗开始和动态功耗相抗衡，已成为低功耗设计一个不可忽视的因素。
In deep sub - micron technology, the mount of the static power catches up with the dynamic power gradually and the standby power is becoming an important factor in low power design.
进入深亚微米工艺后，静态功耗开始和动态功耗相抗衡，已成为低功耗设计一个不可忽视的因素。
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