Available for Electro Chemical Marking and Deep-Etching operations.
可用于电化标示和电深蚀刻操作。
The stationary potential deep-etching method is most available than other method to prepare for metallograph analyses on SEM.
恒电位深腐蚀法是目前已知的制备扫描电镜用试样的最有效的方法。
The eutectic growth of cast iron during rapid solidification has been studied with laser remelting and deep etching.
采用激光快速熔凝和深腐蚀技术，对快速凝固过程中铸铁的共晶生长进行了研究。
This accelerometer is fabricated by N type silicon wafer. To obtain high aspect ratio structure, deep reactive ion etching(DRIE) process is employed.
加速度计用普通的N型硅片制造，为了刻蚀高深宽比的结构，使用了深反应离子刻蚀（DRIE）工艺。
A tunneling accelerometer is fabricated and characterized based on the extension of the silicon-glass anodic-bonding and deep etching releasing process provided by Peking University.
提出了一种基于北京大学硅玻璃键合深刻蚀释放工艺的扩展工艺，用来加工微型隧道加速度计。
The device USES a deep etching with a shallow etching to shield the "static mirror" effect.
该器件采用一次深刻蚀与一次浅刻蚀，从而屏蔽掉“静态镜面”的影响。
Making method of high deep-width rate, batch production of planar windings with LIGA process and silicon deep etching process is researched .
较深入地研究了以LIGA工艺、硅深刻蚀工艺为主的平面绕阻的高深宽比、批量化制作方法。
That means the etching systems have to be capable of creating extremely deep and narrow trenches in silicon, at the nanometer scale, with immense precision.
因为这意味着蚀刻系统必须能以纳米刻度，以超高精度在芯片上刻下极深、极窄的沟槽。
The invention also discloses a chemical etching agent matched with the compound to take deep etch to glass, silicon water and metal material.
本发明还公布了与光成像组合物配合使用，对玻璃，硅晶片、金属基材等进行深度刻蚀的化学刻蚀剂。
A new method to fabricate continuous deep relief microstructure with enzyme-etching silver halide gelatin is proposed.
提出酶蚀卤化银明胶制作连续深浮雕微结构的新方法。
The consequences are benefit to Silicon electrochemical micromachining technology and the technology will be hopeful to become an new technology about Silicon deep-holes etching technology.
其结果对进一步开展这方面的研究工作具有指导意义，在进一步深入开展研究电化学体硅微加工技术时，可有望成为实现硅深孔列阵加工的新技术。
The consequences are benefit to Silicon electrochemical micromachining technology and the technology will be hopeful to become an new technology about Silicon deep-holes etching technology.
其结果对进一步开展这方面的研究工作具有指导意义，在进一步深入开展研究电化学体硅微加工技术时，可有望成为实现硅深孔列阵加工的新技术。
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