Low voltage high current reactive ion plating is a new progress in the field of optical thin films deposition techniques.
光学薄膜低压大电流反应离子镀技术是近年来光学薄膜技术领域中的最新进展。
TiO2 thin films were deposited on glass and quartz substrates, respectively, using the direct current reactive magnetron sputtering method.
采用直流磁控反应溅射法，在玻璃和石英基体上制备了TiO2薄膜。
TiO2 thin films were deposited on glass and quartz substrates, respectively, using the direct current reactive magnetron sputtering method.
采用直流磁控反应溅射法，在玻璃和石英基体上制备了TiO2薄膜。
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