Large current hot cathode glow discharge was used for plasma chemical vapor deposition of diamond films. It improved deposition rate and films quality efficiently.
大电流热阴极辉光放电用于等离子体化学气相沉积金刚石膜，有效地提高了沉积速率和膜品质。
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
It can extend the life of battery and decrease ups system failure rate to the problem of under-voltage, low capacity and discharge current not meeting load startup request.
主要针对UPS蓄电池段电压不够、容量不足或瞬间放电电流不满足带载启动要求等问题。可以延长蓄电池的使用寿命，降低UPS系统故障率。
The results showed that the component contents, particle size distribution, discharge rate obviously affected current density distribution, but less affected the SOC.
结果表明，材料的组分含量、粒度分布、放电倍率对电流密度影响较大，对SOC状态影响较小。
The results showed that the component contents, particle size distribution, discharge rate obviously affected current density distribution, but less affected the SOC.
结果表明，材料的组分含量、粒度分布、放电倍率对电流密度影响较大，对SOC状态影响较小。
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