This system is used for photolithographys with clearance existed. The clearances for manufacturing different width of lines gained from experiments are presented.
该系统可以在有间隙的情况下进行光刻，并通过实验给出了刻制不同宽度刻线时的间隙量大小。
This system is used for photolithographys with clearance existed. The clearances for manufacturing different width of lines gained from experiments are presented.
该系统可以在有间隙的情况下进行光刻，并通过实验给出了刻制不同宽度刻线时的间隙量大小。
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