The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。
An in situ residual gas analyzer (RGA) was used to monitor the residual gas composition in the vacuum chamber.
利用残余气体分析仪在线监测了真空室内的残余气氛组成。
Finally a hypodermic type probe was inserted in to the base of the coffee bean hopper to monitor the temperature of the beans prior to entering the grinding chamber.
最后，一个类似于皮下注射类型的探头嵌入到咖啡豆漏斗的底部，用来检测咖啡豆进入研磨室之前的温度。
Finally a hypodermic type probe was inserted in to the base of the coffee bean hopper to monitor the temperature of the beans prior to entering the grinding chamber.
最后，一个类似于皮下注射类型的探头嵌入到咖啡豆漏斗的底部，用来检测咖啡豆进入研磨室之前的温度。
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